{"id":1007,"date":"2015-07-24T18:31:22","date_gmt":"2015-07-24T09:31:22","guid":{"rendered":"https:\/\/labs.eng.hokudai.ac.jp\/labo\/HUXPSLab\/?p=1007"},"modified":"2022-09-02T15:34:07","modified_gmt":"2022-09-02T06:34:07","slug":"20150724","status":"publish","type":"post","link":"https:\/\/c-mng.cwh.hokudai.ac.jp\/XPSLab.eng\/Root\/xps\/20150724.html","title":{"rendered":"XPS\u306eAr+\u30a4\u30aa\u30f3\u30ac\u30f3\u306e\u4fee\u7406\u304c\u5b8c\u4e86\u3057\u307e\u3057\u305f\uff06\u5404\u7a2e\u5909\u66f4\u70b9\u306b\u3064\u3044\u3066"},"content":{"rendered":"
\t\t\t\tRepair of XPS of Ar + ion gun has been completed.<\/p>\n
As usual, it is possible that contamination removal and depth profile by Ar+ ion etching<\/p>\n
With the maintenance of ion gun, there is a change in the XPS settings. Please check it.<\/p>\n
\u30fbChanging the angle aperture and the field aperture values for setting the measurement area 1mm\u03c6. Each new values are\u00a0 34 and 14 from 32 and 12.<\/p>\n
\u30fbThe etching rate of Ar+ ion gun is changed in each channel.<\/p>\n
Ch1: 10.0nm \/ min<\/p>\n
Ch2: 5.6nm \/ min<\/p>\n
Ch3: 1.5nm \/ min<\/p>\n
Ch4 (Tilt-10 \u00b0 at the time): 12.0nm \/ min<\/p>\n
Please check the latest XPS measurement simple manual.<\/p>\n